%0 Journal Article
%T FABRICATION OF ANTIREFLECTIVE SUBWAVELENGTH GRATING AT INFRARED 30μm REGION<br>红外30μm亚波长抗反射光栅的制作
%A CAO Zhao-Liang
%A LU Zhen-Wu
%A ZHANG Ping
%A WANG Shu-Rong
%A ZHAO Jing-Li
%A LI Feng-You
%A <br>曹召良
%A 卢振武
%A 张平
%A 王淑荣
%A 赵晶丽
%A 李凤有
%J 红外与毫米波学报
%D 2004
%I Science Press
%X Antireflective subwavelength grating was designed by using rigorous coupled wave approach(RCWA). The square-pillar grating was fabricated by plasma assisted etching. Testing results show that the grating has a very good antireflective characteristic, and the values of testing parameters approximately equal to the designed data. It indicates that the plasma assisted etching method is valid to fabricate deep groove grating. The experimental results are analyzed and discusssed. It is shown that the critical periodic point as a function of refractive index is very important to fabricate the antireflective aubwavelength grating.
%K rigorous couple wave approach(RCWA)
%K subwavelength
%K antireflection
%K grating<br>亚波长
%K 抗反射光栅
%K 严格耦合波理论
%K 红外技术
%K 等离子体辅助刻蚀
%K 光栅参数
%K 衍射光学元件
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=D3B4F771D1A06062008B4D0A2EF05996&aid=81D7C8DE4BE9115A&yid=D0E58B75BFD8E51C&vid=EA389574707BDED3&iid=CA4FD0336C81A37A&sid=B31275AF3241DB2D&eid=F3090AE9B60B7ED1&journal_id=1001-9014&journal_name=红外与毫米波学报&referenced_num=2&reference_num=9