%0 Journal Article
%T PREPARATION AND CHARACTERIZATION OF THERMALLY SENSITIVE VANADIUM OXIDE FILMS<br>氧化钒热敏薄膜的制备及其性质的研究
%A ZHOU Jin
%A RU Guo Ping
%A LI Bing Zong
%A LIANG Ping Zhi
%A <br>周进
%A 茹国平
%J 红外与毫米波学报
%D 2001
%I Science Press
%X A new method of preparation of vanadium oxide films was reported.A thin VO x(x<2.5) film with good thermal sensitivity was prepared by ion beam sputtering of a V 2O 5 powder target and with a subsequent reduction annealing in mixing gas of N 2+H 2. The VO x(x<2.5) film has a negative temperature coefficient of resistance (TCR) of (-1~-4)%K -1 ,and an activation energy of 0.078eV~0.110eV. The relatively high TCR as well as low formation temperature shows that the film prepared by the new method is promising for application as thermal sensor material in an uncooled IR microbolometer.
%K vanadium oxide
%K uncooled IR micro bolometer
%K ion beam sputtering
%K TCR
%K reduction annealing<br>氧化钒
%K 非致冷红外微测辐射热计
%K 离子束溅射
%K 电阻温度系数
%K 氮氢退火
%K 热敏薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=D3B4F771D1A06062008B4D0A2EF05996&aid=916365A7554D756560B886519C3FA378&yid=14E7EF987E4155E6&vid=A04140E723CB732E&iid=E158A972A605785F&sid=6490F0E20C4B41AD&eid=AF507FDD66D991DA&journal_id=1001-9014&journal_name=红外与毫米波学报&referenced_num=6&reference_num=1