%0 Journal Article
%T NO removal by a non-equilibrium plasma with different background gases<br>不同背景气体下非平衡等离子体去除NO实验
%A SUN Baomin
%A YIN Shui''e
%A SUN Honghu
%A ZHOU Zhipei
%A GAO Xudong
%A ZHANG Yang
%A LI Fei
%A <br>孙保民
%A 尹水娥
%A 孙红华
%A 周志培
%A 高旭东
%A 张扬
%A 李飞
%J 环境科学学报
%D 2010
%I 
%X A testing rig composed of high voltage power and coaxial cylinder-tube dielectric barrier discharge reaction vessel was designed to study NO removal with a non-thermal plasma using different background gases.The influences of applied voltage,ratio of O_2.residence time and discharge power on NO removal rate were also investigated.According to the experimental results,the NO removal rate increases remarkably with discharge voltage within a certain range(Ar:5～7 kV;N_2:9～11 kV)in the different background gases.The presence of O_2 leads to a decreasing removal rate of NO when the background gases are Ar and N_2,and this impact becomes more significant when only Ar is used.An increase in residence time could facilitate NO removal.while this effect is weakened when the residence time reaches a limit value.P.g.7s.To achieve the same NO removal rates.the discharge power needed in an Ar background is far less than that in a N_2 background,although the NO removal rate could generally be promoted by increasing power input.Keeping other conditions constant,the NO removal rate and correspondent energy consumption could be optimized by reasonable selection of ratios of background gases.
%K chlorobenzene
%K biofiltration
%K joint process
%K UV photodegradation
%K ozone<br>氯苯
%K 生物过滤
%K 联合工艺
%K 紫外光降解
%K 臭氧
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=3FF3ABA7486768130C3FF830376F43B398E0C97F0FF2DD53&cid=A7CA601309F5FED03C078BCE383971DC&jid=03A55E61A8750ACAC6AF81EF9E2AC838&aid=E0BD71B95F6D85C53C30074173FBB348&yid=140ECF96957D60B2&vid=340AC2BF8E7AB4FD&iid=CA4FD0336C81A37A&sid=5C3443B19473A746&eid=4F2F18DD6F870C2C&journal_id=0253-2468&journal_name=环境科学学报&referenced_num=0&reference_num=11