%0 Journal Article
%T A Coupled Theoretical Model of the Mechanism of Ultrashort Laser Ablation of Dielectrics<br>超短脉冲激光烧蚀绝缘体材料机理的耦合理论模型
%A LIN Xiao-hui a
%A SUN Yuan-zheng a
%A YANG Jue-kuan a
%A CHEN Yun-fei a
%A b
%A <br>林晓辉
%A 孙元征
%A 杨决宽
%A 陈云飞
%J 光子学报
%D 2009
%I 
%X Based on the Fokker-Planck equation of kinetic theory,the mechanism of ultrashort laser ablation of dielectrics was studied.A coupled model of the mechanism of ablation of dielectrics was developed.Avalanche ionization and multiphoton ionization were considered as the sources during the generation of free electrons.The impact of electron energy and scattering mechanism on electron relaxation time was taken into account.The calculated threshold damage fluences were in good agreement with experimental results.The impact of ultrashort pulses on the ablation of dielectrics was described quantitatively.
%K Ultrashort pulses
%K Ablation
%K Avalanche ionization
%K Multiphoton ionization<br>超短脉
%K 中激光
%K 雪崩电离
%K 多光子电离
%K 烧蚀损伤
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=A1A25D8CF9A6D1F63D81F30BF8EC67F3&yid=DE12191FBD62783C&vid=16D8618C6164A3ED&iid=94C357A881DFC066&sid=4827968D9758D8D0&eid=78996380F3108204&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=20