%0 Journal Article
%T Effects of Sputtering Parameters on Optical Constant of NiO_x Thin Films<br>磁控溅射参数对NiO_x薄膜光学常数的影响(英文)
%A LI Xiao-gang
%A TANG Xiao-dong
%A <br>李小刚
%A 唐晓东
%J 光子学报
%D 2009
%I 
%X The effects of sputtering parameters on optical constant of NiOx thin films prepared by reactive magnetron sputtering were studied by spectroscopic ellipsometry, XRD and XPS methods. The optical constant of the deposited films became smaller with O2/Ar flow ratios increasing. After annealing, the refractive index shows an increase, especially at a high O2/Ar flow ratio, while the extinction coefficient reduced by about 50%. The refractive index is greater for a higher sputtering power while smaller for a higher work pressure. It is related to the existence of interstitial oxygen and vacancy of Ni, the decomposition of NiOx and compactness degree of NiOx films, respectively.
%K Optical constant
%K NiOx Thin films
%K Spurtting parameters<br>光学常数
%K NiOx薄膜
%K 溅射参数
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=5C3281CDE294CC363A024DE28152F548&yid=DE12191FBD62783C&vid=16D8618C6164A3ED&iid=0B39A22176CE99FB&sid=119B6C0AA09DE6B9&eid=31BCE06A2FD82A16&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=16