%0 Journal Article
%T Reflectance of Ir Layer in Vacuum Ultraviolet Wavelength Region Deposited by Ion Beam Sputtering<br>离子束溅射沉积Ir膜真空紫外反射特性研究
%A GAN Shu-yi
%A LIU Zheng-kun
%A SHENG Bin
%A XU Xiang-dong
%A HONG Yi-lin
%A LIU Ying
%A ZHOU Hong-jun
%A HUO Tong-lin
%A FU Shao-jun
%A <br>干蜀毅
%A 刘正坤
%A 盛斌
%A 徐向东
%A 洪义麟
%A 刘颍
%A 周洪军
%A 霍同林
%A 付绍军
%J 光子学报
%D 2009
%I 
%X Based on the theoretical model of single metal layer on Absorbing substrate,the thickness optimum calculation was performed for Ir layer on Bk7,quartz glass and Si substrate in the vacuum ultravialet(VUV) wavelength region.Single layer Ir films of different thicknesses were fabricated on those substrates by ion beam sputtering technique(IBS).The influence of substrate,layer thickness,ion beam energy and post-annealing on the reflectance were investigated,and nearly 30% normal incident reflectance at 120 nm ...
%K VUV reflecting layer
%K VUV reflectance
%K Ir film
%K IBS<br>真空紫外反射膜
%K 真空紫外反射率
%K Ir膜
%K 离子束溅射
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=71DE941391DD527E926E72D7F32257B1&yid=DE12191FBD62783C&vid=16D8618C6164A3ED&iid=94C357A881DFC066&sid=86CBF6E43FA9E551&eid=C4B40BDE3E33484C&journal_id=1004-4213&journal_name=光子学报&referenced_num=1&reference_num=15