%0 Journal Article
%T Analysis of Stress Birefringence for Silica Waveguide on Silicon and SOI Rib Waveguide<br>硅基二氧化硅波导和SOI脊型波导应力双折射研究
%A Information
%A Electron Engineering College
%A Zhejiang Gongshang University
%A Hangzhou
%A <br>何忠蛟
%J 光子学报
%D 2006
%I 
%X The birefringence originated from the residual stress of the silica waveguide on the silicon and the SOI (Silicon on Insulator) rib waveguide is analyzed using the finite element method. It is found that the coefficient of the stress birefringence is of the order of 10 -4 for the silica waveguide on the silicon; the coefficient is of the order of 10 -5 and 10 -3 for the SOI rib waveguide covered by air and SiO-2 respectively.It can be seen that the large birefringence arise in the silica waveguide on the silicon and the SOI rib waveguide covered by the SiO-2 while there is small birefringence in the SOI rib waveguide covered by air.
%K Optical waveguide
%K Stress
%K Birefringence
%K Finite element method<br>光波导
%K 应力
%K 双折射
%K 有限元方法
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=9BFC157D15B679A1&yid=37904DC365DD7266&vid=6209D9E8050195F5&iid=0B39A22176CE99FB&sid=BC084ACE66B62CC8&eid=02DC3A182A5530DF&journal_id=1004-4213&journal_name=光子学报&referenced_num=4&reference_num=21