%0 Journal Article
%T Design and Fabrication of High Reflection Multilayer for the Wavelength Range 50~110 nm<br>50~110 nm波段高反射率多层膜的设计与制备
%A LI Cun-xia
%A WANG Zhan-shan
%A WANG Feng-li
%A ZHU Jing-tao
%A WU Yong-rong
%A WANG Hong-chang
%A CHENG Xin-bin
%A CHEN Ling-yan
%A <br>李存霞
%A 王占山
%A 王风丽
%A 朱京涛
%A 吴永荣
%A 王洪昌
%A 程鑫彬
%A 陈玲燕
%J 光子学报
%D 2007
%I 
%X A design method of sub-quarter-wave multilayers with enhanced normal reflectance in the strong absorbing range 50~110 nm has been presented.The multilayers consisted in the superposition of a few layers of strong absorbing materials.The optical thickness of each layer in the multilayers is less than quarter-wave thickness.Compared to the standard multilayers,this multilayer structure more suits to enhance reflectance of strong absorbing wavelength range.High reflectance multilayers Si/W/Co was designed at wavelength of 50 nm by using this method,and then optimized based on this initial condition by using Levenberg-Marquart algorithm in a wide wavelength range 50~110 nm.The calculated results suggest that the reflectance of the multilayer is as high as 45%.The sample was fabricated by using a high vacuum direct current magnetron sputtering.Then,the multilayer was characterized by a low angle X-ray diffraction.The results suggest that the fabricated multilayer structure meets the design requirement.
%K Sub-quarter-wave
%K Multilayer
%K EUV
%K Reflectivity
%K Magnetron sputtering<br>亚四分之一波长
%K 多层膜
%K 极紫外
%K 高反射率
%K 磁控溅射
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=E7658AFBBC737817E3D41979B2B013C0&yid=A732AF04DDA03BB3&vid=933658645952ED9F&iid=F3090AE9B60B7ED1&sid=1A1522797E8D4D41&eid=EC06C22A73BC2956&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=17