%0 Journal Article
%T Influence of Oxygen Partial Pressure on the Mechanical and Optical Properties of SiO2 Films Prepared by Electron Beam Evaporation<br>氧分压对电子束蒸发SiO2薄膜机械性质和光学性质的影响
%A 邵淑英
%A 范正修
%A 邵建达
%A 沈卫星
%A 江敏华
%J 光子学报
%D 2005
%I 
%X Thin SiO_2 films have been deposited by electron beam evapouration method.The influences of oxygen partial pressure on the mechanical,surface morphology and optical properties were studied.The results show that the residual stress in the SiO_2 films varied from compressive stress to tensile stress with the oxygen partial pressure increase,which may be attributed to the evolution of the microstructure.At the same time,the surface roughness became larger and the refractive index decreased with the increase of the oxygen pressure.
%K SiO_2 films
%K Oxygen partial pressure
%K Residual stress
%K Surface morphology
%K Refractive index
%K Electron beam evaporation<br>SiO2薄膜
%K 氧分压
%K 残余应力
%K 表面形貌
%K 折射率
%K 电子束蒸发
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=66AA7C0A40188481&yid=2DD7160C83D0ACED&vid=339D79302DF62549&iid=94C357A881DFC066&sid=81D76BB45305F8B7&eid=04EA291949415E08&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=15