%0 Journal Article
%T Antireflective Thin Film Design Using ITO Material<br>ITO材料在减反射膜设计中的应用
%A Xu Ying
%A GAO Jinsong
%A WANG Xiaoyi
%A Chen Hong
%A Wang Tongtong
%A <br>徐颖
%A 高劲松
%A 王笑夷
%A 陈红
%A 王彤彤
%J 光子学报
%D 2005
%I 
%X Usually, ITO transparent conductive thin film is made up of only one layer of ITO material with the mean transmittance of nearly 90% in the visible region of the spectrum. The results of using two different new design to produce antireflective film with ITO and deposition them by RLVIP technique are discussed.The mean optical transmittance of thin film of T= 95.83%、the maximum transmittance of T_ max=97.26% and the sheet resistance of R_□=13.2～24.6Ω/□ are achieved by the design in experiments.
%K ITO transparent conductive film
%K Reactive low voltage ion plating
%K Sheet Resistance
%K Antireflective film<br>ITO透明导电膜
%K 低压反应离子镀
%K 方块电阻
%K 减反射膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=688F280715C9A43A&yid=2DD7160C83D0ACED&vid=339D79302DF62549&iid=5D311CA918CA9A03&sid=F61A98B4CFAD5F2A&eid=53A4507B400B4E65&journal_id=1004-4213&journal_name=光子学报&referenced_num=7&reference_num=14