%0 Journal Article
%T A Novel Two-Step Alignment Technique for Imprint Lithography<br>压印光刻中的两步对正技术
%A Wang Li
%A Lu Bingheng
%A Ding Yucheng
%A Liu Hongzhong
%A <br>王莉
%A 卢秉恒
%A 丁玉成
%A 刘红忠
%J 光子学报
%D 2006
%I 
%X A two-step alignment,coarse-fine alignment, is proposed for obtaining high alignment accuracy in room-temperature imprint lithography process.A pair of special slant gratings are used as alignment marks. Coarse alignment was realized by observing the borderlines of the superposed marks through object lens,and alignment accuracy is within the capture range of fine alignment.The Moiré signals in the linear region for fine alignment generated by the alignment marks were detected by a photo-detector array and used to estimate the fine alignment errors in x and y directions respectively.Since the linear region of moiré signal is very steep,the signals highly sensitive to alignment error can be obtained and used to control the alignment of a X-Y stage by fine positioning.The final alignment accuracy can reach ±21 nm in x direction and ±24 nm in y direction.
%K Imprint lithography
%K Alignment accuracy
%K Grating
%K Moir
%K signal
%K Coarse alignment
%K Fine alignment<br>压印光刻
%K 对正准确度
%K 光栅
%K 莫尔信号
%K 粗对正
%K 精对正
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=72876CC26B064DF2&yid=37904DC365DD7266&vid=6209D9E8050195F5&iid=F3090AE9B60B7ED1&sid=771E2DBBF647F0DE&eid=2E3D2E3C7A6F11A2&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=6