%0 Journal Article
%T Effects of the Structure of HfO2 Thin Films on Its Laser-induced Damage Threshold<br>HfO2薄膜的结构对抗激光损伤阈值的影响
%A 高卫东
%A 张伟丽
%A 范树海
%A 张大伟
%A 邵建达
%A 范正修
%J 光子学报
%D 2005
%I 
%X HfO 2 films have been deposited with electron beam evaporation of HfO 2 and ion assisted electron beam evaporation of Hf. Optical and structural properties and laser induce damage threshold of the films have been studied; it was found that HfO 2 film deposited with electron beam evaporation of Hf with ion assisted technology shows uniform structural properties and higher laser induced damage threshold. The relation between structural and damage threshold of HfO 2 films has also been studied.
%K HfO_2 Film
%K Laser-induced damage threshold<br>铪
%K 氧化铪
%K 薄膜
%K 激光损伤阈值
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=37704F2B787A8ADD&yid=2DD7160C83D0ACED&vid=339D79302DF62549&iid=0B39A22176CE99FB&sid=5BC9492E1D772407&eid=E114CF9BB47B65BE&journal_id=1004-4213&journal_name=光子学报&referenced_num=18&reference_num=18