%0 Journal Article %T GROWTH OF InP BY MOVPE
InP的MOVPE生长 %A Liu Xianglin %A Lu Dacheng %A Wang Xiaohui %A Wang Du %A Dong Jianrong %A
刘祥林 %A 陆大成 %A 王晓晖 %A 汪度 %A 董建荣 %J 光子学报 %D 1996 %I %X InP epitaxial layer has been grown by home made atmospheric pressure.MOVPE equipment with domestic trimethylindium and imported phosphine.Its mobility at 77 K is 65300 cm2/V.s,which is the highest low-temperature mobility of InP grown by any method up to now in Cmna. %K MOVPE %K InP %K Mobility
MOVPE %K InP %K 迁移率 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=9F6139E34DAA109F9C104697BF49FC39&aid=E79FB1C76F7EE322BA06244A884EF0E5&yid=8A15F8B0AA0E5323&vid=C5154311167311FE&iid=0B39A22176CE99FB&sid=D59111839E7C8BDF&eid=3F0AF5EDBC960DB0&journal_id=1004-4213&journal_name=光子学报&referenced_num=0&reference_num=0