%0 Journal Article
%T FABRICATION OF VARIABLE THICKNESS SUPERCONDUCTING MICROBRIDGES WITH THE PILE-UP MASKING TECHNIQUE<br>用堆集掩模技术制造变厚超导微桥
%A Shi Xiangqing
%A Yang Caibing
%A Qi Yizhi
%A Cao Xiaoneng
%A Ma Jindi
%A Huang Jizhang
%A <br>时贤庆
%A 杨彩炳
%A 祁宜芝
%A 曹效能
%A 马金娣
%A 黄继章
%J 电子与信息学报
%D 1987
%I 
%X A pile-up masking technique using the conventional optical lithography and a two-step or three-step evaporation process is developed to fabricate the variable thickness superconducting microbridges of submicron. The l-V characterise of the microbridges made by the technique is measured at 4.2 k.
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=EFC0377B03BD8D0EF4BBB548AC5F739A&aid=8205FAEB042203A0&yid=9C2DB0A0D5ABE6F8&vid=9CF7A0430CBB2DFD&iid=94C357A881DFC066&sid=8143FF92EEF26F96&eid=DA4893B5F9885621&journal_id=1009-5896&journal_name=电子与信息学报&referenced_num=0&reference_num=4