%0 Journal Article
%T Thermal stability of HfO2/Si (001) films prepared by electron beam evaporation in ultrahigh vacuum using atomic oxygen<br>
%A Xu Run
%A Gong Wei-Ming
%A Yan Zhi-Jun
%A Wang Lin-Jun
%A Xia Yi-Ben
%A <br>
%J 中国物理 B
%D 2010
%I 
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=CD8D6A6897B9334F09D8D1648C376FB4&aid=A7539A389031D6526591A3BF89BD7F3C&yid=140ECF96957D60B2&vid=2A8D03AD8076A2E3&iid=59906B3B2830C2C5&journal_id=1009-1963&journal_name=中国物理&referenced_num=0&reference_num=15