%0 Journal Article
%T Atomic diffusion in annealed Cu/SiO2/Si (100) system prepared bymagnetron sputtering<br>
%A Cao Bo
%A Jia Yan-Hui
%A Li Gong-Ping
%A Chen Xi-Meng
%A <br>
%J 中国物理 B
%D 2010
%I 
%K diffusion
%K interface reaction
%K copper silicides<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=CD8D6A6897B9334F09D8D1648C376FB4&aid=36BD22EEFAB98589112B61759D8CBEF1&yid=140ECF96957D60B2&vid=2A8D03AD8076A2E3&iid=0B39A22176CE99FB&journal_id=1009-1963&journal_name=中国物理&referenced_num=0&reference_num=24