%0 Journal Article
%T Pyrosol process for deposition of fluorine-doped tin dioxide thin films<br>溶胶凝胶法制备参氟二氧化锡薄膜
%A Qu Yi
%A Zhang Xin
%A Chen Hong
%A Gao Jin-Yue
%A Zhou Da-Fan
%A <br>曲　艺
%A 张　馨
%A 陈　红
%A 高锦岳
%A 周大凡
%J 中国物理 B
%D 2005
%I 
%X Transparent low-resistance SnO$_{2}$:F films, suitable as a low-emissivity and conducting coating, have been deposited on silica-coated soda lime glass substrates by pyrosol process. SnCl$_{4}\cdot $5H$_{2}$O and NH$_{4}$F dissolved in solvent of 50{\%} C$_{2}$H$_{5}$OH/50{\%} H$_{2}$O served as the starting solution. With the parameters such as substrate temperature of 450${^\circ}$C, distance between the nozzle and substrate of 60mm, carrier gas flow rate of 8L/min and deposition time of 5min, the optimized SnO$_{2}$:F films having a sheet resistance of about 2$\Omega$/$\Box$, were deposited repeatedly. The relationship between sheet resistances and infrared transmission spectra of SnO$_{2}$:F films is shown schematically.
%K pyrosol deposition
%K tin dioxide
%K conducting coating<br>溶胶凝胶
%K 二氧化锡
%K 导电膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=CD8D6A6897B9334F09D8D1648C376FB4&aid=26270A253851777CA31BA82092CE6994&yid=2DD7160C83D0ACED&vid=F3583C8E78166B9E&iid=DF92D298D3FF1E6E&sid=1658FDEF8AE04907&eid=71F658B36F902583&journal_id=1009-1963&journal_name=中国物理&referenced_num=0&reference_num=8