%0 Journal Article
%T NANO-CRYSTALLINE SILICON FILMS PRODUCED BY LAYER-BY-LAYER DEPOSITION TECHNIQUE AND THEIR NOVEL PROPERTIES<br>
%A CHEN MAO-RUI
%A CHEN KUN-JI
%A <br>
%J 中国物理 B
%D 1994
%I 
%X We have applied the layer-by-layer deposition technique to the growth of nano-crystalline silicon films by varying the hydrogen plasma exposure time. The tailoring effect of hydrogen plasma has been studied, The novel optical and electronic proper-ties of these films have also been reported.
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=CD8D6A6897B9334F09D8D1648C376FB4&aid=AB5E334A769CA88D927E271E0CFD3612&yid=3EBE383EEA0A6494&vid=38B194292C032A66&iid=E158A972A605785F&sid=1D01216AD76577EC&eid=01622E3E475F966C&journal_id=1009-1963&journal_name=中国物理&referenced_num=0&reference_num=0