%0 Journal Article
%T A Novel Duplex Low-temperature Chromizing Process at 500oC<br>A Novel Duplex Low-temperature Chromizing Process at 500℃
%A Huiliang CAO
%A Cuilan WU
%A Jiangwen LIU
%A Chengping LUO
%A Ganfeng ZOU
%A <br>Huiliang
%A CAO
%A Cuilan
%A WU
%A Jiangwen
%A LIU
%A Chengping
%A LUO
%A Ganfeng
%A ZOU
%J 材料科学技术学报
%D 2007
%I 
%X An optimized low-temperature chromizing process at 500℃ was realized on a plain medium-carbon steel with 0.45 wt pct carbon via a duplex chromizing process which consists of a precursor plasma nitriding, and a followed salt bath thermoreactive deposition and diffusion （TRD） chromizing process. CrN layer with a thin diffusion layer underneath was formed. The duplex chromizing process was studied by optical microscopy （OM）, scanning electron microscopy （SEM）, energy dispersive X-ray spectroscopy （EDS）, X-ray diffraction （XRD）, and transmission electron microscopy （TEM）. It was found that the chromizing speed at 500℃ was successfully enhanced by adding more Cr-Fe powders into the salt bath, and the CrN layer formed at the cost of the prior nitride compound layer. A CrN layer with average 8.1/~m in thickness and 1382 HV0.01 in microhardness was formed on the substrate by duplex chromizing at 500℃ for 24 h. Further more, the CrN layer consisted of nanocrystalline CrN grains.
%K Chromizing
%K Plasma nitriding
%K Thermoreactive deposition and diffusion (TRD)
%K CrN<br>铬化作用
%K 等离子体
%K 对热反应
%K 金属材料
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=F1839B40C8AE1F67D2E74C7BB5452E3E&yid=A732AF04DDA03BB3&vid=EA389574707BDED3&iid=B31275AF3241DB2D&sid=CE504F5B1E192581&eid=AC3946AB81989513&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=23