%0 Journal Article
%T Improvement of Optical Reactivity for Nano-TiO2 Film by Nitrogen ECR Plasma
%A Yuying XIONG
%A Tao MA
%A Linghong KONG
%A Junfang CHEN
%A Xianqiu WU
%A Honghua YU
%A Zhenxi ZHANG
%A <br>Yuying
%A XIONG
%A Tao
%A MA
%A Ling
%A hong
%A KONG
%A Junfang
%A CHEN
%A Xianqiu
%A WU
%A Honghua
%A YU
%A Zhenxi
%A ZHANG
%J 材料科学技术学报
%D 2006
%I 
%X Nitrogen ion was implanted into the nano-TiO2 film surfaces by electron cyclotron resonance (ECR) plasma modification to improve the optical reactivity in visible-light region for nano-TiO2. Diagnosing the N2 plasma by optical emission spectroscopy (OES) was applied to the process of plasma modification. X-ray photoelectron spectroscopy (XPS) was used for analysis of the binding of element after plasma modification. It is shown that the surface modification was caused by excitated N. The injecting of N2 and N2 leads to the increase in the dissociative interstitial state N in the films. The doped N makes for TiO2-xNx appearing in the TiO2films. TiO2-xNx forms the impurity energy state in the TiO2 energy band gap and reduces the energy band gap. This is the main reason leading to the red shift of absorption edge.
%K ECR plasma surface treatment
%K Titanium dioxide nitrogen doping
%K Optical emission spectroscopy
%K X-ray photoelectron spectroscopy<br>纳米二氧化钛薄膜
%K 表面处理
%K 氮
%K 掺杂
%K 电子回旋加速器谐振源等离子体改性
%K 发射光谱学
%K X射线光电子光谱学
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=F0BA3E59E1D24EB6E0BCB441E6E4CE83&yid=37904DC365DD7266&vid=BC12EA701C895178&iid=38B194292C032A66&sid=A5111BA190517959&eid=EF78DD85C21CB57F&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=23