%0 Journal Article
%T Densification Behavior of Nanocrystalline Mg2Si Compact in Hot-pressing
%A Wei XIONG
%A Xiaoying QIN
%A Li WANG
%A <br>Wei
%A XIONG
%A Xiaoying
%A QINt
%A Li
%A WANG
%J 材料科学技术学报
%D 2007
%I 
%X Densification behavior of nanocrystalline Mg2Si (n-Mg2Si) with grain size about 30-50 nm was investigated by hot-pressing at 400℃. The results indicated that the densification process of n-Mg2Si exhibited three linear segments: p＜0.3 GPa, 0.3 GPa＜p＜1.2 GPa, and p＞l.2 GPa determined by Heckel formula, among which the third fast increasing segment in high pressure range p＞1.2 GPa has seldom been reported in conventional coarse-grained polycrystalline materials. Nevertheless, in the whole pressure range (0.125-1.500 GPa) investigated the densification behavior of n-Mg2Si can be well described by a Kawakita formula p/C=(1/a)p 1/(ab) with constant a=0.452 being in good agreement with the initial porosity of the compact.
%K Nanocrystalline Mg2Si
%K Densification behavior
%K Hot-pressing<br>稠化作用
%K 热压制技术
%K Mg2Si
%K 特殊材料
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=F1839B40C8AE1F67987B87C97EA1391D&yid=A732AF04DDA03BB3&vid=EA389574707BDED3&iid=94C357A881DFC066&sid=240CB58995465C01&eid=4720E9D07E8A2290&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=14