%0 Journal Article
%T Characterization of C-N Thin Films Prepared by Ion Beam Sputtering
%A Yongjun TIAN
%A Xuejun REN
%A Dongli YU
%A Julong HE
%A Shizhen CHEN
%A Dongchun LIRicheng YU
%A Ming ZHANG
%A Winkui WANG
%A <br>
%J 材料科学技术学报
%D 1996
%I 
%X C-N thin films have been prepared by ion beam sputtering using pure N2 as discharge gas. The ratio N/C of the films measured by Auger spectrum is 20% on an average. The results of X-ray diffraction and transmission electron microscopy show that β-C3N4 phase exists in the films. Xray photoelectron spectroscopy shows that nitrogen is mostly combined with carbon with triple (C=N) and double (C=N) bonds. The IR absorption shows an absorption bond near 2185 cm-1assigned to the C=N, no trace of C-C bond was observed
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=890AF92DC711CEC6&yid=8A15F8B0AA0E5323&vid=59906B3B2830C2C5&iid=E158A972A605785F&sid=7737D2F848706113&eid=AA5FB09E1F81059E&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=0