%0 Journal Article
%T Photocatalytic Property of TiO2 Films Deposited by Pulsed DC Magnetron Sputtering<br>Photocatalytic Property of TiO_2 Films Deposited by Pulsed DC Magnetron Sputtering
%A Wenjie ZHANG
%A Shenglong ZHU
%A Ying LI
%A Fuhui WANG
%A <br>Wenjie ZHANG
%A Shenglong ZHU
%A Ying LI and Fuhui WANG State Key Laboratory for Corrosion and Protection
%A Institute of Metal Research
%A Chinese Academy of Sciences
%A Shenyang
%A China
%J 材料科学技术学报
%D 2004
%I 
%X TiO2 thin films were prepared by DC magnetron sputtering with the oxygen flow rate higher than the threshold. The film deposited for 5 h was of anatase phase with a preferred orientation along the <220> direction, but the films deposited for 2 and 3 h were amorphous. The transmittance and photocatalytic activity of the TiO2 films increased constantly with increasing film thickness. When the annealing temperature was lower than 700℃, only anatase grew in the TiO2 film. TiO2 phase changed from anatase to rutile when the annealing temperature was above 800℃. The photocatalytic activity decreased with increasing annealing temperature.
%K TiO2 film
%K Photocatalytic activity
%K DC magnetron sputtering
%K Film characteristic<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=16C85B687C75B61937080535665CEA31&yid=D0E58B75BFD8E51C&vid=A04140E723CB732E&iid=CA4FD0336C81A37A&sid=4AD960B5AD2D111A&eid=339D79302DF62549&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=19