%0 Journal Article
%T Characterization of ZnO:Al Films Deposited on Organic Substrate by r.f. Magnetron Sputtering<br>Characterization of ZnO：Al Films Deposited on Organic Substrate by r.f. Magnetron Sputtering
%A Jin MA
%A Xiaotao HAO
%A Shiyong ZHANG
%A Honglei MA
%A <br>Jin MA
%A Xiaotao HAO Shiyong ZHANG and Honglei MA School of Physics and Microelectronics
%A Institute of Optoelectronic Materials & Devices
%A Shandong University
%A Jinan
%A China Institute of Science
%A Chang An University
%A Xi''''an
%A China
%J 材料科学技术学报
%D 2003
%I 
%X Transparent conducting Al-doped zinc oxide (ZnO:AI) films with good adhesion have been deposited on polyimide thin film substrates by r.f. magnetron sputtering technique at low substrate temperature (25-180℃). The structural, optical and electrical properties of the deposited films were investigated. High quality films with electrical resistivity as low as 8.5×10-4 Ω·cm and the average transmittance over 74% in the wavelength range of the visible spectrum have been obtained. The electron carrier concentrations are in the range from 2.9×1020 to 7.1×1020 cm-3 with mobilities from 4 to 8.8 cm2 V-1s-1. The densities of the films are in the range from 4.58 to 5.16 g/cm-3.
%K Zinc oxide
%K Microstructure
%K Electrical and optical properties<br>ZnO：Al薄膜
%K 氧化锌薄膜
%K 铝掺杂
%K 磁控管
%K 溅射
%K 微观结构
%K 电学性质
%K 光学性质
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=B811198FC68CCBF4B2D32B55B2D0D707&yid=D43C4A19B2EE3C0A&vid=2A8D03AD8076A2E3&iid=E158A972A605785F&sid=8C27CCA578E52082&eid=683005D16807E4FE&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=14