%0 Journal Article
%T Influence of Experimental Parameters on Reactive Magnetron Sputtering CN_x Thin Films
%A Weitao ZHENG
%A Tao DING IIvanov
%A J-E Sundgren
%A <br>
%J 材料科学技术学报
%D 1997
%I 
%X Carbon nitride thin films were deposited on Si(001) using unbalanced magnetron sputtering at different experimental parameters. The effects of nitrogen partial pressure, substrate temperature and substrate bias on the deposition rate and nitrogen content are discussed.
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=324DC3CAB22330DB19158AE0A9B7BFA5&aid=F61FF0EF186386AE&yid=5370399DC954B911&vid=FC0714F8D2EB605D&iid=0B39A22176CE99FB&sid=E2546871E5B846EF&eid=3F0AF5EDBC960DB0&journal_id=1005-0302&journal_name=材料科学技术学报&referenced_num=0&reference_num=0