%0 Journal Article
%T The structure and hydrogen storage characteristic of magnetron sputtering Ti--base alloy films<br>磁控溅射Ti合金薄膜结构特征及贮氢性能
%A MA Aihua
%A ZHENG Hua
%A LIU Shi
%A WANG Longbao
%A <br>马爱华
%A 郑华
%A 于洪波
%A 刘实
%A 王隆保
%J 材料研究学报
%D 2005
%I 
%X The magnetron sputtering method was used to prepare Ti-base alloy films. The concentration of the alloy elements such as Mo, Zr and Al in the films is consistent with that in the targets, while the Y concentration has a large deviation from that in the targets. The hydrogen absorption dynamics of the four films at 673 K is fine and the TiZrYAI film has the best hydriding activity. The hydrogen storage capacities of all the four films exceed 1.5 (H/M). The hydrogen absorption P-C isotherms of the films were measured. The films alloying with Mo have the highest hydrogen absorption equilibrium pressure, which is determined as about 10-4 Pa at ambient temperature.
%K metallic materials
%K magnetron sputtering
%K Ti alloy film
%K hydrogen storage<br>金属材料
%K 磁控溅射
%K Ti合金薄膜
%K 贮氢
%K 磁控溅射
%K 合金薄膜
%K 结构特征
%K 贮氢性能
%K films
%K alloy
%K magnetron
%K sputtering
%K storage
%K characteristic
%K hydrogen
%K 室温
%K 外推
%K 吸氢平衡压
%K 曲线
%K 饱和吸氢量
%K 现象
%K 脱膜
%K 吸氢动力学性能
%K 膜材
%K 工艺
%K 偏差
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=D48A6684E5F8ADD4&yid=2DD7160C83D0ACED&vid=2A8D03AD8076A2E3&iid=CA4FD0336C81A37A&sid=0401E2DB1F51F8DE&eid=4F2F18DD6F870C2C&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=1&reference_num=12