%0 Journal Article
%T CARBON NITRIDE FILMS DEPOSITED BY REACTIVE IONIZED CLUSTER BEAM METHOD<br>反应离化团束（RICB）法生长CN硬质薄膜
%A XIE Junqing
%A FENG Jiayou
%A ZHENG Yi
%A <br>谢俊清
%A 冯嘉猷
%A 郑毅
%J 材料研究学报
%D 1996
%I 
%X Carbon nitride thin films have been prepared by reactive ionized cluster beam (RICB)technique on Si(100)and NaCl(100) substrates, using low molecular weight polyethylene as evaporation material and ammonia as reactive gas. As revealed by transmission elec
%K ionized cluster beam
%K carbon nitride films<br>离化团束
%K C－N薄膜
%K 薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=537B2B1298D72081&yid=8A15F8B0AA0E5323&vid=F3090AE9B60B7ED1&iid=94C357A881DFC066&sid=20C3B205768D55E0&eid=652E7E360EBE3082&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=5