%0 Journal Article
%T Structure and properties of ta-C films deposited by filtered cathodic vacuum arc technology as a function of substrate bias<br>衬底偏压对四面体非晶碳膜结构和性能的影响
%A ZHU Jiaqi MENG Songhe HAN Jiecai TAN Manlin
%A <br>朱嘉琦
%A 孟松鹤
%A 韩杰才
%A 檀满林
%J 材料研究学报
%D 2004
%I 
%X Tetrahedral amorphous carbon (ta-C) films have been deposited on P-type (100) polished c-silicon wafer with different substrate negative bias by filtered cathodic vacuum arc technology. The microstructure of ta-C films was measured by visible Raman spectroscopy and the spectra were fitted with a single skewed Lorentzian peak described by BWF function. The coupling coefficient characterizes the asymmetric degree of the spectra and is correlated with the sp3 content. The surface morphology and mechanical properties were researched respectively by AFM and Nano-lndentor. When the substrate bias is -80 V, the sp3 content is the most, the root mean square surface roughness is least (Rq=0.23 nm) and hardness (51.49 GPa), Young's modulus (512.39 GPa), and critical scratching load (11.72 mN) are the highest. As the substrate bias increases or decreases, the sp3 content and other properties lower correspondingly.
%K inorganic non-metallic materials
%K tetrahedral amorphous carbon (ta-C)
%K filtered cathodic vacuum arc (FCVA)
%K substrate bias
%K Raman spectra
%K mechanical properties<br>无机非金属材料
%K 四面体非晶碳
%K 过滤阴极真空电弧
%K 衬底偏压
%K Raman光谱
%K 机械性能
%K 衬底偏压
%K 四面体非晶碳
%K 膜结构和性能
%K 影响
%K substrate
%K bias
%K function
%K technology
%K cathodic
%K vacuum
%K arc
%K films
%K properties
%K 性能指标
%K 载荷
%K 刮擦
%K 临界
%K 杨氏模量
%K 硬度
%K 表面粗糙度值
%K 均方根
%K 结果
%K 力学性能
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=5DC8821AA0D2BCE2&yid=D0E58B75BFD8E51C&vid=13553B2D12F347E8&iid=CA4FD0336C81A37A&sid=228A710F49B6CE58&eid=35FC3610259C2B32&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=1&reference_num=23