%0 Journal Article
%T CONTROLLING DEPOSITION RATE OF ITO FILM BY SPECTROMETRY<br>光谱法控制ITO膜沉积速率
%A HUANG Shiyong
%A WANG Demiao
%A REN Gaocao
%A CHEN Kangsheng
%A <br>黄士勇
%A 王德苗
%A 任高潮
%A 陈抗生
%J 材料研究学报
%D 1997
%I 
%X In the ITO films deposition by reactive magnetron sputtering, the deposition rate of ITO film will change with the carrying out of sputtering. We provide a new method to monitor the sputtering viel by detecting the characteristic light intensity of plasma spetra, and the process using this method is presentCd in thc ITO films deposition in the paper.
%K spectrometry sputtering yield plasma ITO films<br>光谱法
%K 溅射速率
%K ITO膜
%K 氧化铟锡
%K 薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=6D2F0EE3957FFE26&yid=5370399DC954B911&vid=708DD6B15D2464E8&iid=38B194292C032A66&sid=A5B34D9E8FDA439A&eid=6C069F4B248105A5&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=1&reference_num=2