%0 Journal Article
%T THE COMPOSITION AND MICROSTRUCTURE OF THE Ti(C,N) FILMS PRODUCED BY LASER CHEMICAL VAPOUR GROWTH<br>激光化学气相反应生长Ti（C,N）薄膜的成分及微观结构
%A ZHANG Bingchun
%A LI Mei
%A WANG Yaqing
%A FENG Zhongchao
%A <br>张炳春
%A 李梅
%A 王亚庆
%A 冯钟潮
%J 材料研究学报
%D 1998
%I 
%X The composition and microstructure of Ti(C,N) films, which were produced by laser chemical deposition on Ti-6Al-4V substrate, were studied by the combined techniques of XRD, EPMA,TEM. The large area, uniform films which were mainly Ti(C,N) with small amounts of Ti2N phase, can be produced. The Al, V concentrations in films were lower than that of the substrates. TEM images implied that the films were equiaxial nano-crystalline without preferred orientation.
%K laser
%K chemical vapour growth of thin film
%K Ti(C
%K N)<br>激光
%K 化学气相反应
%K 薄膜
%K Ti（C
%K N）
%K 微观结构
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=49ED0F9173B98881&yid=8CAA3A429E3EA654&vid=59906B3B2830C2C5&iid=B31275AF3241DB2D&sid=46FF101E7ECF9F15&eid=66D0A4667FE1A38D&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=3&reference_num=3