%0 Journal Article
%T Ultra-Thin Silicon Carbon Nitride Film: a Promising Protective Coating for Read/Write Heads in Magnetic Storage Devices<br>
%A GAO Peng
%A XU Jun
%A DING Wan-Yu
%A DONG Chuang
%A <br>
%J 中国物理快报
%D 2009
%I 
%X Ultra-thin amorphous Si-C-N films, down to 2nm, have been synthesized by MW-ECR plasma enhanced unbalanced magnetron sputtering. The friction coefficient of the film is only 0.11, determined in dry friction tests against the GCr15 ball at a load of 400mN for 20min. The films exhibit good protection against corrosion when they are immersed in a more severe corrosion environment of 0.1mol/L oxalic acid for 12h compared to the usual conditions (0.05mol/L, 4min) used in current computer industries. These good properties can be attributed to the smooth, dense and pore free structure of the film. These indicate that the Si-C-N film synthesized by the present technique may be a promising protective coating for read/write heads and other magnetic storage devices.
%K 52
%K 77
%K Dq
%K 81
%K 15
%K Cd
%K 81
%K 65
%K Kn<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=EFC6AA6F4244602E40A0A62436357FF3&yid=DE12191FBD62783C&vid=96C778EE049EE47D&iid=B31275AF3241DB2D&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=0