%0 Journal Article
%T Formation for Bass-Relief Microprofiles Based on an Analytic Formulation
%A SHI Li-Fang
%A DONG Xiao-Chun
%A DENG Qi-Ling
%A LUO Xian-Gang
%A DU Chun-Lei
%A <br>史立芳
%A 董小春
%A 邓启凌
%A 罗先刚
%A 杜春雷
%J 中国物理快报
%D 2007
%I 
%X A method of fast design and fabrication for bass-relief micro-profiles is developed by using an analytic formulation to determine the exposure distribution. Based on an equivalent exposure threshold model, the formulation is simplified for the case of bass-relief profile corresponding to the smaller exposure dose. The mask function for a microlens array is designed without iteration involved by the analytic formulation. The experiment is performed to validate the method, and the fabrication result is obtained with the profile error less than 30nm (rms).
%K 42
%K 79
%K Bh<br>感光材料
%K 光学应用
%K 显微镜
%K 光学技术
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=03664AC44D480818046C1495EA6F7818&yid=A732AF04DDA03BB3&vid=B91E8C6D6FE990DB&iid=F3090AE9B60B7ED1&sid=4A5BEFCBB1C293EE&eid=2C9C419B408CCD32&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=0