%0 Journal Article
%T Effect of Silane Flow Rate on Structure and Corrosion Resistance of Ti-Si-N Thin Films Deposited by a Hybrid Cathodic Arc and Chemical Vapour Process<br>
%A YIN Long-Cheng
%A LUAN Sen
%A LV Guo-Hua
%A WANG Xing-Quan
%A HUANG Jun
%A JIN Hui
%A FENG Ke-Cheng
%A YANG Si-Ze
%A <br>
%J 中国物理快报
%D 2008
%I 
%X Ti--Si--N thin films with different silicon contents are deposited by a cathodic arc technique in an Ar+N2+SiH4 mixture atmosphere. With the increase of silane flow rate, the content of silicon in the Ti--Si--N films varies from 2.0at.% to 12.2at.%. Meanwhile, the cross-sectional morphology of these films changes from an apparent columnar microstructure to a dense fine-grained structure. The x-ray diffractometer (XRD) and x-ray photoelectron spectroscopy (XPS) results show that the Ti--Si--N film consists of TiN crystallites and SiNx amorphous phase. The corrosion resistance is improved with the increase of silane flow rate. Growth defects in the films produced play a key role in the corrosion process, especially for the local corrosion. The porosity of the films decreases from 0.13% to 0.00032% by introducing silane at the flow rate of 14sccm.
%K 52
%K 75
%K -d
%K 61
%K 82
%K Rx
%K 68
%K 60
%K -p<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=18F637202E05E46B8DB235688710B341&yid=67289AFF6305E306&vid=C5154311167311FE&iid=708DD6B15D2464E8&sid=1E8A0DB169793C90&eid=B34694EE00B06B25&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=0