%0 Journal Article
%T APPLICATIONS OF X-RAY DOUBLE CRYSTAL DIFFRACTION TO INVESTGATION OF NEW MATERIALS<br>X 射线双晶衍射在新材料研究中的应用
%A ZHU Nanchang LI Runshen CHEN Jingyi
%A <br>朱南昌
%A 李润身
%A 陈京一
%J 材料研究学报
%D 1991
%I 
%X The fundamental theory of X-ray double-crystal diffractometry is pres-ented in this paper.The applications of this technique to investigation or new structuralmaterials,which include ion implantation into semiconductor materials,single or multipleepitaxial layers,strained-layer superlattices and other new elctronic and optical materials,have been introduced.As the examples,the results of high energy B~+ implanted intoSi(100) wafer and In_xGa_(1-x)AS/GaAs strained-layer superlattice are also given.
%K ion implantation
%K X-ray double-crystal diffraction
%K computer simulation<br>离子注入
%K X
%K 射线双晶衍射
%K 计算机模拟
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=84529CA2B2E519AC&jid=C101C4C04993B4D94FCD8446E6CBEB3B&aid=CBECC19BA819638B&yid=116CB34717B0B183&vid=94C357A881DFC066&iid=0B39A22176CE99FB&sid=28F8B56DB6BEE30E&eid=76B5E24D6EC46B4B&journal_id=1005-3093&journal_name=材料研究学报&referenced_num=0&reference_num=1