%0 Journal Article
%T Comparison of TiO2 and ZrO2 Films Deposited by Electron-Beam Evaporation and by Sol-Gel Process
%A YAO Jian-Ke
%A LI Hai-Yuan
%A FAN Zheng-Xiu
%A TANG Yong-Xing
%A JIN Yun-Xia
%A ZHAO Yuan-An
%A HE Hong-Bo
%A SHAO Jian-Da
%A <br>姚建可
%A 李海源
%A 范正修
%A 唐永兴
%A 晋云霞
%A 赵元安
%A 贺洪波
%A 邵建达
%J 中国物理快报
%D 2007
%I 
%X TiO2 and ZrO2 films are deposited by electron-beam (EB) evaporation and by sol-gel process. The film properties are characterized by visible and Fourier-transform infrared spectrometry, x-ray diffraction analysis, surface roughness measure, absorption and laser-induced damage threshold (LIDT) test. It is found that the sol-gel films have lower refractive index, packing density androughness than EB deposited films due to their amorphous structure and high OH group concentration in the film. The high LIDT of sol-gel films is mainly due to their amorphous and porous structure, and low absorption. LIDT of EB deposited film is considerably affected by defects in the film, and LIDT of sol-gel deposited film is mainly effected by residual organic impurities and solvent trapped in the film.
%K 42
%K 79
%K Wc
%K 68
%K 55
%K Jk
%K 68
%K 60
%K Wm<br>TiO2
%K ZrO2
%K 沉淀物
%K 电子束
%K 薄膜
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=03664AC44D4808187EC9015B63BD909D&yid=A732AF04DDA03BB3&vid=B91E8C6D6FE990DB&iid=DF92D298D3FF1E6E&sid=29B68C6EE36B014B&eid=C7EA1836BA194C9B&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=0