%0 Journal Article
%T Deposition of TiN Films by Novel Filter Cathodic Arc Technique
%A NIU Er-Wu
%A FAN Song-Hua
%A LI Li
%A LU Guo-Hua
%A FENG Wen-Ran
%A ZHANG Gu-Ling
%A YANG Si-Ze
%A <br>牛二武
%A 范松华
%A 李立
%A 吕国华
%A 冯文然
%A 张谷令
%A 杨思泽
%J 中国物理快报
%D 2006
%I 
%X A straight magnetic filtering arc source is used to deposit thin films of titanium nitride. The properties of the films depend strongly on the deposition process. TiN films can be deposited directly onto heated substrates in a nitrogen atmosphere or onto unbiased substrates by condensing the Ti+ ion beam in about 300eV N2+ nitrogen ion bombardment. In the latter case, the film stoichiometry is varied from an N:Ti ratio of 0.6--1.1 by controlling the arrival rates of Ti and nitrogen ions. Meanwhile, simple models are used to describe the evolution of compressive stress as function of the arrival ratio and the composition of the ion-assisted TiN films.
%K 52
%K 77
%K -j
%K 52
%K 75
%K -d
%K 61
%K 82
%K Bg<br>沉积作用
%K TiN薄膜
%K 滤光器
%K 阴极弧技术
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=6E709DC38FA1D09A4B578DD0906875B5B44D4D294832BB8E&cid=47EA7CFDDEBB28E0&jid=E27DA92E19FE279A273627875A70D74D&aid=53799B16CBE7D279ADE2BD675B393B66&yid=37904DC365DD7266&vid=EA389574707BDED3&iid=B31275AF3241DB2D&sid=2838795948C22802&eid=CC00A075BF965716&journal_id=0256-307X&journal_name=中国物理快报&referenced_num=0&reference_num=16