%0 Journal Article
%T A Novel Cellular Automata Model for Silicon Bulk Etching Simulation Handling High Index Planes<br>考虑高指数晶面的体硅腐蚀模拟新CA模型
%A Zhou Zaif
%A Huang Qing''an
%A Li Weihua
%A Deng Wei
%A <br>周再发
%A 黄庆安
%A 李伟华
%A 邓伟
%J 半导体学报
%D 2007
%I 
%X A novel three-dimensional (3D) continuous cellular automata (CA) model is presented for the simulation of silicon bulk etching processes.More high-index planes such as (211),(311),(331),(411) planes have been successfully incorporated into the novel 3D continuous CA model to increase the simulation accuracy.Simulation results agree with experimental results,indicating that the simulation accuracy has been increased.This is useful for the research of silicon bulk etching process and micro-electro-mechanical system (MEMS) design.
%K cellular automata
%K etching simulation
%K micromachining
%K MEMS
%K anisotropic etching<br>元胞自动机
%K 腐蚀模拟
%K 微机电系统
%K 微加工技术
%K 各向异性腐蚀
%K 高密勒指数
%K 晶面
%K 体硅腐蚀
%K 腐蚀模拟
%K 模型
%K Index
%K High
%K Handling
%K Simulation
%K Bulk
%K Etching
%K Silicon
%K Cellular
%K Automata
%K Model
%K 意义
%K 设计水平
%K MEMS
%K 模拟研究
%K 模拟效果
%K 模拟结果
%K 实验
%K 元胞自动机
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=CFB161A9A241FF7B&yid=A732AF04DDA03BB3&vid=D3E34374A0D77D7F&iid=94C357A881DFC066&sid=507521DBC725630F&eid=FA98B938D085B826&journal_id=1674-4926&journal_name=半导体学报&referenced_num=2&reference_num=11