%0 Journal Article
%T Fabrication of Sub-20nm Metal Nanogaps from Nanoconnections by the Extended Proximity Effect<br>拓展临近效应由纳米连接制备亚20nm金属Nanogaps
%A Sun Yan
%A Chen Xin
%A Dai Ning
%A <br>孙艳
%A 陈鑫
%A 戴宁
%J 半导体学报
%D 2008
%I 
%X We describe the fabrication of metal nanogaps of sub-20nm in feature size using the proximity effect in electron beam lithography (EBL).The proximity effect is extended to develop a flexible and practical method for preparing metal (e.g.Au or Ag) nanogaps and arrays in combination with a transfer process (e.g.,deposition/lift-off).Different from the direct gap-writing process,the nanogap precursor structures (nanoconnections) were designed by GDSII software and then written by electron beam.Following a deposition and lift-off process,the metal nanogaps were obtained and the nanogap size can be lowered to ~10nm by controlling the exposure dose in EBL.
%K metal nanogap
%K nanofabrication
%K proximity effect
%K electron beam lithography<br>金属nanogap
%K 纳米构筑技术
%K 临近效应
%K 电子束光刻
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=BDBDEB914E1F31EBBEF438BC99D12B35&yid=67289AFF6305E306&vid=771469D9D58C34FF&iid=9CF7A0430CBB2DFD&sid=9E8E868F1632249A&eid=764931DBFDAAC8C1&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=17