%0 Journal Article
%T Design for manufacturability of a VDSM standard cell library<br>超深亚微米可制造标准单元库设计
%A Zhou Chong
%A Chen Lan
%A Zeng Jianping
%A Yin Minghui
%A Zhao Jie
%A <br>周宠
%A 陈岚
%A 曾健平
%A 尹明会
%A 赵劼
%J 半导体学报
%D 2012
%I 
%X This paper presents a method of designing a 65 nm DFM standard cell library. By reducing the amount of the library largely, the process of optical proximity correction (OPC) becomes more efficient and the need for large storage is reduced. This library is more manufacture-friendly as each cell has been optimized according to the DFM rule and optical simulation. The area penalty is minor compared with traditional library, and the timing, as well as power has a good performance. Furthermore, this library has passed the test from the Technology Design Department of Foundry. The result shows this DFM standard cell library has advantages that improve the yield.
%K design for manufacturability
%K reduced standard cell library
%K layout optimization
%K optical simulation
%K yield<br>标准单元库
%K 制造设计
%K 超深亚微米
%K 光学邻近校正
%K 传统图书馆
%K 铸造工艺设计
%K 大容量存储
%K 设计方法
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=4CFB0EE1AD3DD1DFEC1F2BC008D9637A&yid=99E9153A83D4CB11&vid=27746BCEEE58E9DC&iid=0B39A22176CE99FB&sid=956280E271D7394E&eid=B31275AF3241DB2D&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=10