%0 Journal Article
%T Highly controllable ICP etching of GaAs based materials for grating fabrication<br>
%A Qiu Weibin
%A <br>
%J 半导体学报
%D 2012
%I 
%K semiconductor process
%K inductively coupled plasma
%K dry etching
%K gratings<br>
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=4CFB0EE1AD3DD1DF48C17040C751AFE0&yid=99E9153A83D4CB11&vid=27746BCEEE58E9DC&iid=0B39A22176CE99FB&sid=9D150821EF1D4A0E&eid=94C357A881DFC066&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=16