%0 Journal Article
%T Rule of Oxidation Rate in Vertical Cavity Surface Emitting Lasers<br>垂直腔面发射激光器中氧化速率规律的研究
%A Feng Yuan
%A Zhong Jingchang
%A Hao Yongqin
%A Zhao Yingjie
%A Hou Lifeng
%A Yao Yanping
%A <br>冯源
%A 钟景昌
%A 郝永芹
%A 赵英杰
%A 侯立峰
%A 么艳萍
%J 半导体学报
%D 2008
%I 
%X This research is based on the selective oxidation experiments under different conditions,in which the microstructure pictures and the component contents of the produced oxide in different depths are obtained.The oxidation rate is mainly controlled by diffusion;therefore,the experimental results are analyzed with the kinetics of thermal diffusion.It shows that the results of mathematical derivation are basically in agreement with the experimental results.Thus it is concluded that the concentration of oxidant is exponentially declined as the depth of oxidation in vertical cavity surface emitting lasers increases.
%K VCSEL
%K selective oxidation
%K oxidation rate
%K diffusion rate<br>垂直腔面发射激光器
%K 选择性氧化
%K 氧化速率
%K 扩散速率
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=696F2618A99D98EB06A89D7EC65A3641&yid=67289AFF6305E306&vid=771469D9D58C34FF&iid=59906B3B2830C2C5&sid=FB474E05BEE5C0B6&eid=C7B12F806433804F&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=10