%0 Journal Article %T Stoichiometry in SI-GaAs Bulk Materials by Triple Axis Mode X-Ray Diffraction Measurements
X射线三轴晶衍射法测量半绝缘GaAs单晶的化学配比 %A Li Jianming %A Tu Hailing %A Hu Guangyong %A Wang Chaoqun %A Zheng Ansheng %A Qian Jiayu %A
黎建明 %A 屠海令 %A 胡广勇 %A 王超群 %A 郑安生 %A 钱嘉裕 %J 半导体学报 %D 2002 %I %X The lattice parameters of SI GaAs are accurately measured by triple axis mode X ray diffraction method.The stoichiometry in SI GaAs bulk materials is calculated based on the model of the interstitial pairs for describing excess arsenic in GaAs.Triple axis mode X ray diffraction measurements are non destructive and high precision.The reasons of affecting the lattice parameters of SI GaAs are discussed. %K lattice parameters %K stoichiometry %K double %K crystal X %K ray diffraction %K triple axis mode X %K ray diffraction
晶格参数 %K 化学配比 %K 双晶衍射 %K 三轴晶模式衍射 %U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=0A55E041DCFD7FAE&yid=C3ACC247184A22C1&vid=EA389574707BDED3&iid=708DD6B15D2464E8&sid=F61A98B4CFAD5F2A&eid=ACF317960D6DF955&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=35