%0 Journal Article
%T Novel photoresist stripping technology using steam-water mixture<br>一种新的基于水蒸气和水混合流体去胶方法
%A Wang Lei
%A Hui Yu
%A Gao Chaoqun
%A Jing Yupeng
%A <br>王磊
%A 惠瑜
%A 高超群
%A 景玉鹏
%J 半导体学报
%D 2011
%I 
%X A novel wet vapor photoresist stripping technology is developed as an alternative to dry plasma ashing and wet stripping. Experiments using this technology to strip hard baked SU-8 photoresist, aurum and chromium film are carried out. Then the images of stripping results are shown and the mechanism is analyzed and discussed. The most striking result of this experiment is that the spraying mixture of steam and water droplets can strip photoresist and even metal film with ease.
%K photoresist stripping
%K plasma ash
%K wet stripping
%K steam-water mixture
%K jet spray<br>光刻胶剥离，等离子灰化，湿法剥离，水蒸气和水混合流体，射流
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=786307CB160BCFD2FA67292CC22ADC7E&yid=9377ED8094509821&vid=9971A5E270697F23&iid=0B39A22176CE99FB&sid=9D150821EF1D4A0E&eid=DF92D298D3FF1E6E&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=0