%0 Journal Article
%T PL Emission of Low-Dimensional Structures Formed by Laser Irradiation<br>激光加工形成硅基上的氧化低维纳米结构的PL发光
%A Huang Weiqi
%A Wu Keyue
%A Xu Li
%A Wang Haixu
%A Jin Feng
%A Liu Shirong
%A Qin Zhaojian
%A Qin Shuijie
%A <br>黄伟其
%A 吴克跃
%A 许丽
%A 王海旭
%A 金峰
%A 刘世荣
%A 秦朝建
%A 秦水介
%J 半导体学报
%D 2008
%I 
%X Certain low-dimensional nanostructures can be formed by laser irradiation on pure silicon samples and on the SiGe alloy samples.These low-dimensional nanostructures are generated by the interaction between semiconductors and the plasma produced with laser irradiation.We studied the photoluminescence (PL) of the hole-net structure of silicon and the porous structure of SiGe where the PL intensity at 706nm and at 725nm wavelength increases significantly.It is proved that surface oxidation of these structures occurs.The effect of intensity-enhancement of the PL peaks cannot be explained by quantum confinement alone.We propose a mechanism for increasing PL emission in the above structures,in which the trap states of the interfaces between SiO2 and nanocrystal play an important role.
%K low-dimensional nanostructures
%K plasma wave
%K photoluminescence
%K interface states<br>氧化低维纳米结构
%K 等离子体波
%K 光致发光
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=AC6CF51C1FAB5B7A979101A499BB4D47&yid=67289AFF6305E306&vid=771469D9D58C34FF&iid=CA4FD0336C81A37A&sid=8477411EEDB08A86&eid=B62E0EEFE746E568&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=16