%0 Journal Article
%T Rate Enhancement of UV/Ozone Dry Depolymerization of Photoresists<br>紫外光/臭氧干法去除光刻胶速率的提高
%A Tan Kaisheng/Institute of Electronics
%A Academia Sinica
%A Beijing
%A <br>谈凯声
%J 半导体学报
%D 1990
%I 
%X This paper discusses several factors influencing the UV/ozone dry depolymerization rateand the ways enhancing the depolymerization rate of photoresists.A new type apparatus andthe experimental results obtained with this apparatus are described.
%K UV/ozone
%K Photoresists
%K Dry depolymerization
%K Depolymerization rate<br>紫外光／臭氧
%K 干法
%K 清除
%K 光刻
%K 胶体
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=07DB116E08177A3C&yid=8D39DA2CB9F38FD0&vid=708DD6B15D2464E8&iid=E158A972A605785F&sid=DFEE4E8C33C95CEF&eid=8ED630AD8C61FAE8&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=3