%0 Journal Article
%T Si/SiGe/Si-SOI by Synchrotron Radiation Double-Crystal Topography and High-Resolution Triple-Axis X-Ray Diffraction<br>Si/SiGe/Si-SOI异质结构的同步辐射双晶貌相术和高分辨三轴晶X射线衍射
%A Ma Tongda
%A Tu Hailing
%A HU Guangyong
%A Shao Beiling
%A Liu Ansheng
%A <br>马通达
%A 屠海令
%A 胡广勇
%A 邵贝羚
%A 刘安生
%J 半导体学报
%D 2005
%I 
%X 运用同步辐射双晶貌相术结合高分辨三轴晶X射线衍射对经原位低温热处理的Si/SiGe/Si-SOI异质结构进行研究，发现Si层（004）衍射峰两侧半高宽（FWHMs）处同步辐射双晶形貌像特征存在明显差异．对同步辐射双晶摇摆曲线中Si层（004）衍射峰的不对称性给予了解释，同时阐明了高分辨三轴晶X射线衍射2θ-ω扫描曲线中Si层（004）衍射双峰与Si层衍射结构的对应关系．
%K synchrotron radiation double-crystal topography
%K high-resolution triple-axis X-ray diffraction
%K double diffraction peaks<br>同步辐射双晶貌相术
%K 高分辨三轴晶X射线衍射
%K 衍射双峰
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=6D80267DFAF179AF&yid=2DD7160C83D0ACED&vid=96C778EE049EE47D&iid=DF92D298D3FF1E6E&sid=D98C4F25072149E5&eid=196264D95F295743&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=18