%0 Journal Article
%T Polarization Dispersion Analysis for Etched Diffraction Grating Demultiplexer<br>刻蚀衍射光栅解复用器的偏振色散分析
%A Pang Dongqing
%A Song Jun
%A and He Sailing
%A <br>庞冬青
%A 宋军
%A 何赛灵
%J 半导体学报
%D 2005
%I 
%X A design and simulation method based on the method of moment (MoM) is proposed for an etched diffraction grating (EDG) demultiplexer.The method of moment is used to calculate the surface current,which produces the diffracted field at the image plane,for both polarizations.Some misplaying at the aspect of the chromatic dispersion characteristic are analyzed using a conventional scalar design for an EDG demultiplexer.It is shown that the primary structure parameters (i.e. the incident angle and the diffraction order) influence the difference of the chromatic dispersions between both polarizations more than the polarization dependent loss.However,when a uniformity of the passband is considered,the structure parameters are obtained mainly based on the characteristic of the polarization dependent loss.
%K wavelength division multiplexing
%K demultiplexer
%K etched diffraction grating
%K method of moment
%K chromatic dispersion
%K polarization<br>波分复用
%K 解复用器
%K 刻蚀衍射光栅
%K 矩量法
%K 色散
%K 偏振
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=B3DF02DFA9A28924&yid=2DD7160C83D0ACED&vid=96C778EE049EE47D&iid=CA4FD0336C81A37A&sid=76B5E24D6EC46B4B&eid=205BE674D84A456D&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=11