%0 Journal Article
%T Using Response Surface Method for Process Synthesis<br>响应表面法在工艺综合中的应用
%A Lu Yong
%A Zhang Wenjun
%A Yang Zhilian
%A <br>鲁勇
%A 张文俊
%A 杨之廉
%J 半导体学报
%D 2002
%I 
%X To take place the process and device simulator,a new RSM,named multi-region RSM,is developed,which integrated into the MOSPAD system.The advantage of MR-RSM is presented,and the analysis of process window is also based on the MR-RSM.
%K response surface method
%K MR-RSM
%K process synthesis
%K MOSPAD
%K process window<br>响应表面法
%K 多分区响应表面法
%K 工艺综合
%K MOSPAD
%K 工艺窗口
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=11360BDBA9872171&yid=C3ACC247184A22C1&vid=EA389574707BDED3&iid=F3090AE9B60B7ED1&sid=76C32027E03E49D7&eid=9C76A7541E963918&journal_id=1674-4926&journal_name=半导体学报&referenced_num=3&reference_num=7