%0 Journal Article
%T Research on Instrument for Testing Sheet Resistance Without Testing Pattern and the Orientation of Probes<br>无测试图形薄层电阻测试仪及探针定位
%A Liu Xinfu
%A Sun Yicai
%A Liu Dongsheng
%A Chen Zhiyong
%A Zhang Yanhui
%A Wang Jing
%A <br>刘新福
%A 孙以材
%A 刘东升
%A 陈志永
%A 张艳辉
%A 王静
%J 半导体学报
%D 2004
%I 
%X A new type of instrument for testing sheet resistance of ULSI wafers by an inclined four-point square probe is introduced.It can be used in the measurement of resistivity uniformity for a wafer specimen without testing pattern.The probes are observed on the display of a computer by a microscope and a head of pickup camera.The testing location of the probes and specimen table is regulated by the way of program control and servo engines.The affection upon measuring results arising from the wander of probes is also discussed and the calculating equation is deduced.The distributing graphs arising from the wander of probes are drawn in theory calculating and in practical testing.A wafer specimen of four inches is measured with the equipment and an equal-value line Mapping graph is drawn.
%K four-probe-techniques
%K sheet resistance
%K wanders of probes
%K equal-value line graph<br>四探针技术
%K 薄层电阻
%K 探针游移
%K 等值线图
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=2A77997624F4A802&yid=D0E58B75BFD8E51C&vid=C5154311167311FE&iid=0B39A22176CE99FB&sid=78F0EFE028BD3783&eid=6ED15D8DCB279BC4&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=16