%0 Journal Article
%T “Zero”DependenceofDepositionRateonDepositionTemperatureinPhotoChemicalVaporDeposition
%A Sun Jiancheng
%A Li Enke
%A Li Peixian
%A Wang Yuqing
%A Zhang Heming
%A Jiang Wenqing
%A Dai Xianying
%A Hu Huiyong
%J 半导体学报
%D 1999
%I 
%X Ｐｈｏｔｏｃｈｅｍｉｃａｌｖａｐｏｒｄｅｐｏｓｉｔｉｏｎｉｓｏｎｅｏｆｔｈｅｌｏｗｔｅｍｐｅｒａｔｕｒｅｔｅｃｈｎｏｌｏｇｉｅｓ，ｗｉｔｈｏｕｔａｎｙｋｎｏｃｋ－ｏｎｄａｍａｇｅｃａｕｓｅｄｂｙｈｉｇｈ－ｅｎｅｒｇｙｉｏｎ...
%U http://www.alljournals.cn/get_abstract_url.aspx?pcid=5B3AB970F71A803DEACDC0559115BFCF0A068CD97DD29835&cid=1319827C0C74AAE8D654BEA21B7F54D3&jid=025C8057C4D37C4BA0041DC7DE7C758F&aid=2917D9B279845874&yid=B914830F5B1D1078&vid=A04140E723CB732E&iid=F3090AE9B60B7ED1&sid=DE4E739E935BD9A7&eid=753F7A67351FADCC&journal_id=1674-4926&journal_name=半导体学报&referenced_num=0&reference_num=0